| Course | |
|---|---|
| Title: | Hands-On Training on MOS technology fabrication techniques in Cleanrooms at CIME Nanotech |
| Start Date: | 05-May-2025 |
| End Date: | 07-May-2025 |
| Time: | 09:00 to 17:00 each day (local time) |
| Location: | CIME Nanotech, 3 parvis Louis Néel, Grenoble, France, Grenoble, France |
| Presenters: | CIME staff |
| Cost: | 225.00 EURO |
| Overview: | This three-day intensive training program offers participants 2.5 days of hands-on experience in a cleanroom and 0.5 days dedicated to electrical characterization. |
| Details: | The course provides practical training with essential tools and techniques for wafer cleaning, photolithography, thin film deposition and etching, thermal processes, and doping. It is designed for engineers, technicians, and graduate students specializing in microelectronics who seek to deepen their knowledge of IC fabrication techniques. Why Join?
What You'll Learn
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| Prerequisites: | This training is suitable for IC design engineers/researchers or PhD students in microelectronics wanting to learn about IC manufacturing technology and gain some practical experience. |