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Course
Title: Hands-On Training on MOS technology fabrication techniques in Cleanrooms at CIME Nanotech
Start Date: 05-May-2025
End Date: 07-May-2025
Time: 09:00 to 17:00 each day (local time)
Location: CIME Nanotech, 3 parvis Louis Néel, Grenoble, France, Grenoble, France
Presenters: CIME staff
Cost: 225.00 EURO
Overview:

This three-day intensive training program offers participants 2.5 days of hands-on experience in a cleanroom and 0.5 days dedicated to electrical characterization.

Details:

The course provides practical training with essential tools and techniques for wafer cleaning, photolithography, thin film deposition and etching, thermal processes, and doping.

It is designed for engineers, technicians, and graduate students specializing in microelectronics who seek to deepen their knowledge of IC fabrication techniques.


Why Join?

  • Hands-on experience in a 750m2 cleanroom with state-of-the-art equipment for research
  • Learn best practices for working in microelectronics environments
  • Enhance your technical skills and knowledge on IC
  • Networking opportunities with experts in the field

What You'll Learn

  • Cleanroom protocols and contamination control
  • Operation on specialized tools (e.g. photolithography, etching, and deposition)
  • Introduction to process flow optimization
  • Practical skills and/or knowledge in IC fabrication technology
Prerequisites:

This training is suitable for IC design engineers/researchers or PhD students in microelectronics wanting to learn about IC manufacturing technology and gain some practical experience.